Skip to content
AkademScholar

Products

For developers

AkademBasesoonDeveloper API
Journal

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

ISSN:
2166-2746
0
h-index
0
Citations
2
Works
0.00
2-year mean citedness

Trust signals

1 of 3 signals present

Independent positive signals — not a single “predatory/legitimate” verdict, but a converging picture.

  • DOAJ
    No data
    doaj.org
  • OAK list
    No data
    OAK
  • Valid ISSN
    Present
    ISSN

This is an information label, not an official ruling. A missing signal is not a penalty — a regional journal may simply not be in DOAJ.

Trends over time

Performance over time

Citation overview

Publications (bars) and citations (line) by year

  • Publications
  • Citations
0101202520262025: Publications 1, Citations 02026: Publications 1, Citations 0

Publication history

01202520262025: Publications 12026: Publications 1

h-index evolution

Cumulative h-index by year

01202520262025: h-index 02026: h-index 0

Most-cited works

  1. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode20250 citations
  2. Hydrogen adsorption on nitrogen-doped graphene in the presence of water: An atomistic study20260 citations