М. К. Рузибаева

Наиболее цитируемые работы

1. Optimum ion implantation and annealing conditions for stimulating secondary negative ion emission201119 цит.
2. Analysis of the structure and properties of heterostructured nanofilms prepared by epitaxy and ion implantation methods201315 цит.
3. Effect of the O+2-ion bombardment on the TiN composition and structure201513 цит.
4. Investigation of change of the composition and structure of the CaF2/Si films surface at the low-energy bombardment201413 цит.
5. Analysis of profiles of atomic distribution over the depth of Si-Me free nanofilm systems20155 цит.
6. Stimulation of secondary negative ion emission by implantation of alkaline ions into the surface layer of a solid followed by heating20103 цит.
7. Effect of Co+-ion implantation on the composition and properties of free Si–Cu nanofilm structures20173 цит.
8. A study of the influence of surface layers’ disordering on the spectrum of energy losses of electrons passed through copper thin single crystal films20112 цит.
9. Formation of Nanodimensional SiO2 Films on the Surface of a Free Si/Cu Film System by $${\text{O}}_{2}^{ + }$$ Ion Implantation20192 цит.
10. A study of the orientation dependence of the electron energy loss spectra for single crystal films of copper and silver20121 цит.