А.С. Рысбаев
- Сўнгги маълум муассаса:
- Tashkent State Technical University named after Islam Karimov
- ORCID:
- 0000-0001-6311-6631
5
h-индекс
4
i10-индекси
91
Иқтибослар
20
Асарлар
Вақт бўйича
Вақт бўйича таҳлил
Иқтибос шарҳи
Йиллар бўйича нашрлар (устун) ва иқтибослар (чизиқ)
- Нашрлар
- Иқтибослар
Иқтибос тарихи
Нашр тарихи
h-индекс эволюцияси
Йиллар бўйича жамланган h-индекс
Энг кўп иқтибос қилинган асарлар
- The Influence of Structural Defects in Silicon on the Formation of Photosensitive Mn4Si7–Si❬Mn❭–Mn4Si7 and Mn4Si7–Si❬Mn❭–M Heterostructures201921 иқтибос
- Formation and Electronic Structure of Barium-Monosilicide- and Barium-Disilicide Films202117 иқтибос
- Formation of nanosize silicides films on the Si(111) and Si(100) surfaces by low-energy ion implantation201415 иқтибос
- Effect of thermal and laser annealing on the atom distribution profiles in Si(111) implanted with P+ and B+ ions201712 иқтибос
- Peculiarities of the electron structure of nanosized ion-implanted layers in silicon20149 иқтибос
- On new two-dimensional structures produced on the Si (111) and Si (100) surface upon molecular-beam epitaxy of cobalt and silicon20113 иқтибос
- Theoretical Explanation of the Effect of a Decrease in the Si(111) Plasmon Energy during the Implantation of Ions with a Large Dose20203 иқтибос
- Influence of structural defects in silicon on formation of photosensitive heterostructures Mn4Si7-Si-Mn4Si7 and Mn4Si7-Si-M20183 иқтибос
- Change of electrophysical properties of the Si(111) and Si(100) surface in the process of ion implantation and next annealing20192 иқтибос
- Thin silicide films: producing and properties20042 иқтибос