У. Х. Расулев
- Soʻnggi maʼlum muassasa:
- Kimyo International University in Tashkent
8
h-indeks
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i10-indeksi
167
Iqtiboslar
41
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- Surface-ionization methods and devices of indication and identification of nitrogen-containing base molecules200020 iqtibos
- Surface-Ionization Mass Spectrometry of Opium Alkaloids200314 iqtibos
- Features of polyatomic ion emission under sputtering of a silicon single crystal by Au− cluster ions200313 iqtibos
- Thermal spikes observed during the tantalum sputtering by gold cluster ions200312 iqtibos
- Comparative study of polyatomic secondary ion emission from silicon with <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si11.gif" overflow="scroll"><mml:mrow><mml:msubsup><mml:mrow><mml:mtext>Au</mml:mtext></mml:mrow><mml:mrow><mml:mi>m</mml:mi></mml:mrow><mml:mrow><mml:mo>-</mml:mo></mml:mrow></mml:msubsup></mml:mrow></mml:math>, <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si12.gif" overflow="scroll"><mml:mrow><mml:msubsup><mml:mrow><mml:mtext>Si</mml:mtext></mml:mrow><mml:mrow><mml:mi>m</mml:mi></mml:mrow><mml:mrow><mml:mo>-</mml:mo></mml:mrow></mml:msubsup></mml:mrow></mml:math> and <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si13.gif" overflow="scroll"><mml:mrow><mml:msubsup><mml:mrow><mml:mtext>C</mml:mtext></mml:mrow><mml:mrow><mml:mi>m</mml:mi></mml:mrow><mml:mrow><mml:mo>-</mml:mo></mml:mrow></mml:msubsup></mml:mrow></mml:math> projectiles200611 iqtibos
- Non-additive effects in secondary-ion emission from V, Nb and Ta under gold-cluster bombardment200411 iqtibos
- Application of surface ionization methods for highly sensitive and selective analysis of benzodiazepine derivatives20049 iqtibos
- High non-additive sputtering of silicon as large positive cluster ions under polyatomic ion bombardment20009 iqtibos
- Application of surface ionization to determine rate constant and activation energy of dissociation reactions of nitrogen base polyatomic molecules on W oxides20068 iqtibos
- Comparative study of kinetic energy spectra and mass distributions of Ta+ ions sputtered from tantalum by atomic and molecular ion bombardment19988 iqtibos